The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2016
Filed:
Apr. 15, 2015
Fujifilm Corporation, Tokyo, JP;
Tatsuya Oba, Kanagawa, JP;
Yoshitaka Maeda, Kanagawa, JP;
Xiao Ling, Kanagawa, JP;
Shun Inoue, Kanagawa, JP;
Takahiro Ohno, Kanagawa, JP;
Yohei Takahashi, Kanagawa, JP;
Megumi Sekiguchi, Kanagawa, JP;
FUJIFILM CORPORATION, Tokyo, JP;
Abstract
A polarizing plate includes: a polymer film; a polarizer; and a stress relaxation layer disposed between the polymer film and the polarizer, wherein a relationship of the following Expression (1) is satisfied, a thickness of the polymer film is equal to or greater than 10 μm, a distance(Ds) from the surface of the polarizing plate on the side of the polymer film to the interface between the polymer film and the stress relaxation layer is equal to or greater than 15 μm, a difference between the distance(Ds) and a thickness(C) of the polymer film is less than 15 μm, and a total thickness of the polymer film and the stress relaxation layer is equal to or less than 80 μm, 0.01<B/A<0.9 . . . (1), in Expression (1), A represents the elastic modulus of the polymer film, and B represents the elastic modulus of the stress relaxation layer.