The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2016
Filed:
Aug. 11, 2014
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Shinya Shakagoori, Kanagawa, JP;
Makoto Ookawa, Kanagawa, JP;
Kazuya Takanashi, Kanagawa, JP;
Katsumi Hara, Kanagawa, JP;
MITSUBISHI RAYON CO., LTD., Tokyo, JP;
Abstract
Provided is a method for producing a cylindrical nanoimprinting mold such that the outer peripheral surface of a cylindrical aluminum substrate is uniformly polished, and it is possible to effectively take advantage of the outer peripheral surface. The method forms an oxide film at the outer peripheral surface () of an aluminum substrate () after polishing the entire outer peripheral surface () of the cylindrical aluminum substrate () by means of a polishing body (), wherein the polishing body () is moved in the axial direction to polish in a manner such that at least a portion of the polishing body () is protruding beyond the first end () side and second end () side of the aluminum substrate (), and the portion of the polishing body () protruding beyond the aluminum substrate () is disposed on and supported by a cylindrical first support member (); and second support member ().