The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2016
Filed:
Aug. 17, 2015
Hyunwoo Kim, Chungju-si, KR;
Wooseok Ko, Seoul, KR;
Minkook Kim, Goyang-si, KR;
Jung Hwan Kim, Pyeongtaek-si, KR;
Yusin Yang, Seoul, KR;
Sangkil Lee, Yongin-si, KR;
Chungsam Jun, Suwon-si, KR;
Hyunwoo Kim, Chungju-si, KR;
Wooseok Ko, Seoul, KR;
Minkook Kim, Goyang-si, KR;
Jung Hwan Kim, Pyeongtaek-si, KR;
Yusin Yang, Seoul, KR;
Sangkil Lee, Yongin-si, KR;
Chungsam Jun, Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Gyeonggi-do, KR;
Abstract
A semiconductor inspection system including an ion beam milling unit configured to irradiate at least one cluster-ion beam onto a surface of a sample wafer and etch the surface of the sample wafer and an image acquisition unit configured to irradiate an electron beam onto the etched surface of the sample wafer and acquire an image of the etched surface may be provided.