The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 27, 2016

Filed:

Nov. 07, 2014
Applicant:

Magna Mirrors of America, Inc., Holland, MI (US);

Inventors:

Hamid Habibi, Holland, MI (US);

Michael L. Gallas, South Haven, MI (US);

Assignee:

MAGNA MIRRORS OF AMERICA, INC., Holland, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1341 (2006.01); B32B 17/10 (2006.01); G02F 1/161 (2006.01); B60R 1/08 (2006.01); G02F 1/157 (2006.01);
U.S. Cl.
CPC ...
G02F 1/161 (2013.01); B32B 17/10917 (2013.01); B60R 1/088 (2013.01); G02F 1/1341 (2013.01); G02F 1/157 (2013.01);
Abstract

A system for filling a variable reflectance vehicular electro-optic element assembly (such as for a rearview mirror assembly) includes a front substrate, a rear substrate and a perimeter seal disposed between the front and rear substrates. The perimeter seal spaces the front and rear substrates apart and forms an interpane cavity therebetween. The perimeter seal has a gap between terminal ends of the perimeter seal to provide a fill port for the mirror reflective element assembly when the front and rear substrates are mated together. The fill port allows an electro-optic medium to flow therethrough during the filling process. During the filling process, the front and rear substrates are fixtured in a chamber with the fill port disposed at an upper portion of the front and rear substrates, with the filling process being one of (i) a gravity feed filling process and (ii) a pressurized filling process.


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