The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2016
Filed:
Jun. 11, 2012
Applicants:
Hendrik Albert Weeber, Groningen, NL;
Patricia Ann Piers, Groningen, NL;
Pablo Artal, Murcia, ES;
Silverstre Manzanera, Lorca, ES;
Inventors:
Hendrik Albert Weeber, Groningen, NL;
Patricia Ann Piers, Groningen, NL;
Pablo Artal, Murcia, ES;
Silverstre Manzanera, Lorca, ES;
Assignee:
AMO Groningen B.V., Groningen, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61F 2/16 (2006.01); G02C 7/02 (2006.01);
U.S. Cl.
CPC ...
G02C 7/02 (2013.01); A61F 2/1613 (2013.01); A61F 2/1637 (2013.01); G02C 2202/20 (2013.01); G02C 2202/22 (2013.01);
Abstract
System, ophthalmic lens, and method for extending depth of focus includes an optic having a clear aperture disposed about a central axis. The optic includes a first surface and an opposing second surface. The first and second surfaces are configured to introduce an asymmetric aberration to the eye while maintaining the in-focus visual acuity.