The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2016
Filed:
Aug. 17, 2011
Kathy Wai Yuen Wong, Hallett Cove, AU;
David Andrew Lewis, Marion, AU;
Fang Chen, Hallett Cove, AU;
Bohdan Grzegorz Cieslinski, Hallett Cove, AU;
Huan Kiak Toh, Fullarton, AU;
Kathy Wai Yuen Wong, Hallett Cove, AU;
David Andrew Lewis, Marion, AU;
Fang Chen, Hallett Cove, AU;
Bohdan Grzegorz Cieslinski, Hallett Cove, AU;
Huan Kiak Toh, Fullarton, AU;
CARL ZEISS VISION AUSTRALIA HOLDINGS LTD., Londsdale, AU;
Abstract
The present invention provides a method for manufacturing a photochromic article having a photochromic compound containing layer. The method includes the step of coating a casting face of at least one mold section with a photochromic host layer. The photochromic host layer is treated to minimize damage during subsequent steps, and a mold is then assembled so that it includes the mold section having the photochromic host layer. The mold is then filled with a photochromic article monomer composition and the monomer composition is subsequently cured to form a photochromic article substrate adhered to the photochromic host layer. The photochromic compound is introduced into the photochromic host layer.