The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2016
Filed:
Feb. 17, 2015
Applicant:
Samsung Display Co., Ltd., Yongin-si, Gyeonggi-do, KR;
Inventor:
Kyung Min Choi, Seoul, KR;
Assignee:
Samsung Display Co., Ltd., , KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/56 (2006.01); C23C 14/16 (2006.01); C23C 16/40 (2006.01); C23C 14/00 (2006.01); C25D 7/06 (2006.01);
U.S. Cl.
CPC ...
C23C 16/56 (2013.01); C23C 14/0021 (2013.01); C23C 14/165 (2013.01); C23C 16/402 (2013.01); C25D 7/0607 (2013.01);
Abstract
A method of manufacturing a nanowire includes: forming a silicon oxide layer by performing deposition of a silicon oxide on a substrate; forming a metal layer by performing deposition of a metal on the silicon oxide layer; forming a metal agglomerate by performing heat treatment on the substrate where the metal layer is formed; and growing a nanowire in an area where the metal agglomerate is formed by performing plasma treatment on the substrate where the metal agglomerate is formed.
Choi, Kyung. (2016). Method for manufacturing nanowires (U.S. Patent No. 9453283). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9453283
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile