The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
Jun. 24, 2010
Applicant:
Yves Jongen, Louvain-la-Neuve, BE;
Inventor:
Yves Jongen, Louvain-la-Neuve, BE;
Assignee:
Ion Beam Applications S.A., Louvain-La-Neuve, BE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 7/08 (2006.01); H05H 7/00 (2006.01); A61N 5/10 (2006.01);
U.S. Cl.
CPC ...
H05H 7/00 (2013.01); A61N 5/1048 (2013.01); A61N 5/1067 (2013.01); A61N 2005/1087 (2013.01);
Abstract
The present invention relates to a pulsed beam particle accelerator which can be used for particle radiation therapy. More particular, a device and method are provided to control the number of particles within a beam pulse. The particle accelerator comprises means for varying the number of particles within each beam pulse of said pulsed ion beam from a minimum value to a maximum value as function of the value of a beam control parameter. For each particle irradiation the required number of particles for each beam pulse is controlled by defining a value for said beam control parameter based on calibration data.