The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2016

Filed:

Aug. 09, 2013
Applicant:

Samsung Display Co., Ltd., Yongin-si, Gyeonggi-do, KR;

Inventors:

Myung-Soo Huh, Yongin, KR;

Cheol-Lae Roh, Yongin, KR;

Seung-Ho Choi, Yongin, KR;

Assignee:

Samsung Display Co., Ltd., Samsung-ro, Giheung-Gu, Yongin-si, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/52 (2006.01); C23C 14/00 (2006.01); C23C 14/08 (2006.01); C23C 14/58 (2006.01);
U.S. Cl.
CPC ...
H01L 51/5206 (2013.01); C23C 14/0036 (2013.01); C23C 14/086 (2013.01); C23C 14/5806 (2013.01); H01L 51/5221 (2013.01); H01L 51/5256 (2013.01); H01L 2251/5369 (2013.01);
Abstract

A method of forming nanocrystals and a method of manufacturing an organic light-emitting display apparatus that includes a metal compound thin film having the nanocrystals. The method of forming nanocrystals includes forming a metal compound thin film under a first pressure by using a reactive sputtering process, and forming the nanocrystals in the metal compound thin film under a second pressure that is lower than the first pressure by using the reactive sputtering process.


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