The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2016

Filed:

Sep. 23, 2014
Applicant:

Agilent Technologies, Inc., Santa Clara, CA (US);

Inventor:

Gershon Perelman, Santa Clara, CA (US);

Assignee:

Agilent Technologies Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 5/00 (2006.01); H01J 29/02 (2006.01); H01J 49/24 (2006.01); H01J 49/26 (2006.01);
U.S. Cl.
CPC ...
H01J 49/24 (2013.01); H01J 49/26 (2013.01);
Abstract

A charged particle processing apparatus includes a vacuum chamber, an optics plate, charged particle optics mounted to the optics plate, and mounting members coupled between the optics plate and a chamber wall. The mounting members are configured for isolating the optics plate from deformation of the chamber wall, as may occur due to a pressure differential between the chamber interior and the environment outside the chamber. The isolation may prevent deformation from affecting the alignment and positioning of the charged particle optics. The charged particles may, for example, be ions or electrons. Thus, the apparatus may be utilized, for example, in analytical instruments such as for mass spectrometry, or inspection instruments such as for electron microscopy.


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