The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
Mar. 04, 2015
Junji Nakai, Kanagawa, JP;
Hiroyoshi Matsumoto, Kanagawa, JP;
Junji Nakai, Kanagawa, JP;
Hiroyoshi Matsumoto, Kanagawa, JP;
Ricoh Company, Ltd., Tokyo, JP;
Abstract
A plasma processing device includes a plasma processing unit that performs plasma processing on a predetermined area on a target recording medium at least two times; and a control unit that sets a plasma energy amount used by the plasma processing unit to perform a first plasma processing on the predetermined area of the target recording medium as a first energy amount and sets a plasma energy amount used by the plasma processing unit to perform a second plasma processing on the predetermined area as a second energy amount smaller than the first energy amount.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile