The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
May. 02, 2013
Applicant:
Hgst Netherlands B.v., Amsterdam, NL;
Inventors:
Wen-Chien David Hsiao, San Jose, CA (US);
Kyusik Shin, Pleasanton, CA (US);
Sue Siyang Zhang, Saratoga, CA (US);
Assignee:
HGST Netherlands B.V., Amsterdam, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/127 (2006.01); H04R 11/00 (2006.01); G11B 5/855 (2006.01); G11B 5/31 (2006.01);
U.S. Cl.
CPC ...
G11B 5/855 (2013.01); G11B 5/1278 (2013.01); G11B 5/3116 (2013.01); G11B 5/3163 (2013.01);
Abstract
The embodiments of the present invention generally relate to a method for forming a trench in which a write pole is deposited therein. The trench is formed with a single mask and multiple reactive ion etching (RIE) processes and has substantially straight side walls and a consistent bevel angle along the length of the write pole. The consistent bevel angle along the length of the write pole allows the bevel angle at the ABS to be consistent regardless of where the cut is when defining the ABS.