The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
Apr. 30, 2014
Applicant:
Mitsubishi Electric Research Laboratories, Inc., Cambridge, MA (US);
Inventors:
Jeroen van Baar, Arlington, MA (US);
Dohyung Seo, Lexintron, MA (US);
Assignee:
Mitsubishi Electric Research Laboratories, Inc., Cambridge, MA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2006.01); G06T 11/60 (2006.01); G06K 9/52 (2006.01); G06T 7/40 (2006.01); G06K 9/62 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0012 (2013.01); G06K 9/52 (2013.01); G06K 9/6215 (2013.01); G06T 7/0026 (2013.01); G06T 7/40 (2013.01); G06T 11/60 (2013.01);
Abstract
A method registers a source image with a target image, wherein the images are deformable, by first measuring dissimilarity between the source image and the target image. The dissimilarity minimized using a discrete energy function. At multiple scales, multi-scale Markov random field registration is applied to the source and target images to determine a deformation vector field. Then, the target image is warped according to the deformation field vector to obtain a warped target mage registered to the source image.