The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2016

Filed:

Mar. 13, 2015
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Takeshi Kawabata, Shizuoka, JP;

Hideaki Tsubaki, Shizuoka, JP;

Hiroo Takizawa, Shizuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03F 7/004 (2006.01); C08F 8/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0388 (2013.01); C08F 8/32 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/2002 (2013.01); G03F 7/2037 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/32 (2013.01); G03F 7/325 (2013.01);
Abstract

There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a repeating unit represented by the specific formula and a group capable of decomposing by an action of an acid to produce a polar group; and an ionic compound represented by the specific formula, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition.


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