The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2016

Filed:

Feb. 18, 2015
Applicant:

Sumitomo Chemical Company, Limited, Tokyo, JP;

Inventors:

Tatsuro Masuyama, Osaka, JP;

Takahiro Yasue, Osaka, JP;

Koji Ichikawa, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D 347/00 (2006.01); C07D 407/12 (2006.01); G03F 7/038 (2006.01); G03F 7/38 (2006.01); G03F 7/027 (2006.01); C07D 307/83 (2006.01);
U.S. Cl.
CPC ...
G03F 7/027 (2013.01); C07D 307/83 (2013.01); C07D 347/00 (2013.01); C07D 407/12 (2013.01); G03F 7/038 (2013.01); G03F 7/38 (2013.01);
Abstract

A photoresist composition comprising


Find Patent Forward Citations

Masuyama, Tatsuro. (2016). Photoresist composition, compound and process of producing photoresist pattern (U.S. Patent No. 9448475). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9448475

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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