The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
Nov. 23, 2011
Yi Wang, New York, NY (US);
Ludovic DE Rochefort, Cachan, FR;
Tian Liu, New York, NY (US);
Ildar Khalidov, St. Petersburg, RU;
Yi Wang, New York, NY (US);
Ludovic de Rochefort, Cachan, FR;
Tian Liu, New York, NY (US);
Ildar Khalidov, St. Petersburg, RU;
CORNELL UNIVERSITY, Ithaca, NY (US);
Abstract
For optimal image quality in susceptibility-weighted imaging and accurate quantification of susceptibility, it is necessary to isolate the local field generated by local magnetic sources (such as iron) from the background field that arises from imperfect shimming and variations in magnetic susceptibility of surrounding tissues (including air). We present a nonparametric background field removal method based on projection onto dipole fields in which the background field inside an ROI is decomposed into a field originating from dipoles outside the ROI using the projection theorem in Hilbert space.