The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2016

Filed:

Jun. 23, 2012
Applicants:

Jeffrey Dean Jennings, Hendersonville, NC (US);

Tony Boyd Tang, Asheville, NC (US);

Keith Alan Roberts, Penrose, NC (US);

Inventors:

Jeffrey Dean Jennings, Hendersonville, NC (US);

Tony Boyd Tang, Asheville, NC (US);

Keith Alan Roberts, Penrose, NC (US);

Assignee:

Equilibar, LLC, Fletcher, NC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16K 7/17 (2006.01); G05D 16/06 (2006.01); G05D 16/18 (2006.01); F16K 1/42 (2006.01); F16K 7/16 (2006.01); F16K 7/12 (2006.01); F16K 31/165 (2006.01);
U.S. Cl.
CPC ...
F16K 7/17 (2013.01); G05D 16/063 (2013.01); G05D 16/0638 (2013.01); G05D 16/0655 (2013.01); G05D 16/185 (2013.01); F16K 1/42 (2013.01); F16K 7/126 (2013.01); F16K 7/16 (2013.01); F16K 31/165 (2013.01);
Abstract

A sealing apparatus for a back pressure regulator includes: a body defining a process surface, and including: at least one process void communicating with the process surface; a recess disposed in the process surface; a floating support hub disposed in the recess, carrying an O-ring; a vent void communicating with the recess; an inlet port disposed in fluid communication with the at least one process void and adapted to be coupled in fluid communication with a fluid at a process pressure; and an outlet port disposed in fluid communication with the vent void; and a diaphragm having opposed reference and process sides, the diaphragm disposed against the body such that the process side is substantially coplanar with the process surface.


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