The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2016

Filed:

Mar. 13, 2014
Applicants:

Dien-yeh Wu, San Jose, CA (US);

Mark S. Johnson, San Jose, CA (US);

David M. Santi, San Mateo, CA (US);

Hyman Lam, San Jose, CA (US);

Inventors:

Dien-Yeh Wu, San Jose, CA (US);

Mark S. Johnson, San Jose, CA (US);

David M. Santi, San Mateo, CA (US);

Hyman Lam, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45561 (2013.01); Y10T 137/0419 (2015.04); Y10T 137/4259 (2015.04);
Abstract

Disclosed are apparatus and methods for supplying a constant flow of precursor gas to a processing chamber. The apparatus described, and methods of use, allow a precursor ampoule to be removed from the gas delivery system without interrupting the process.


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