The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2016
Filed:
Feb. 22, 2011
Applicants:
Ulf Helmersson, Brokind, SE;
Nils Brenning, Johanneshov, SE;
Daniel Soderstrom, Boxholm, SE;
Inventors:
Assignee:
Plasmadvance AB, Brokind, SE;
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/22 (2006.01); C23C 14/54 (2006.01); B22F 9/12 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/223 (2013.01); B22F 9/12 (2013.01); C23C 14/3485 (2013.01); C23C 14/54 (2013.01); C23C 14/544 (2013.01); H01J 37/34 (2013.01); B22F 2999/00 (2013.01);
Abstract
A high production rate plasma sputtering process for producing particles having a size of 10 μm or less is disclosed. The process causes ionization of at least a part of the sputtered target atoms and is performed at such parameters that the pick-up probability of ionized sputtered target atoms on the surface of grains is high.