The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2016
Filed:
Mar. 15, 2013
Applicant:
Google Inc., Mountain View, CA (US);
Inventors:
William Hamburgen, Palo Alto, CA (US);
Lawrence Lam, San Jose, CA (US);
James Tanner, Los Gatos, CA (US);
Assignee:
Google Inc., Mountain View, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 5/04 (2006.01); B32B 15/01 (2006.01); C23F 1/02 (2006.01); H04M 1/02 (2006.01); G06F 1/16 (2006.01); G06F 1/18 (2006.01); C22C 1/02 (2006.01);
U.S. Cl.
CPC ...
H05K 5/04 (2013.01); B32B 15/012 (2013.01); C22C 1/02 (2013.01); C23F 1/02 (2013.01); G06F 1/1613 (2013.01); G06F 1/1679 (2013.01); G06F 1/181 (2013.01); H04M 1/0249 (2013.01); Y10T 29/49002 (2015.01); Y10T 428/12347 (2015.01); Y10T 428/12361 (2015.01); Y10T 428/12757 (2015.01); Y10T 428/12979 (2015.01); Y10T 428/24802 (2015.01); Y10T 428/24851 (2015.01); Y10T 428/24917 (2015.01);
Abstract
A method includes creating an opening in a first outer layer of a multilayer sheet of material, the sheet of material having three or more layers of material, including the first outer layer and a second outer layer. A selective etchant is introduced through the opening, where the etchant selectively etches an interior metal layer of the multilayer sheet of material compared with the first and second outer layers. The selective etchant is permitted to etch material of the interior metal layer under the first outer layer.