The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2016

Filed:

Jun. 04, 2012
Applicants:

Oliver Häberlen, Villach, AT;

Gilberto Curatola, Villach, AT;

Inventors:

Oliver Häberlen, Villach, AT;

Gilberto Curatola, Villach, AT;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01); H01L 29/78 (2006.01); H01L 29/40 (2006.01); H01L 21/28 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/778 (2006.01); H01L 29/812 (2006.01);
U.S. Cl.
CPC ...
H01L 29/402 (2013.01); H01L 21/28 (2013.01); H01L 29/42316 (2013.01); H01L 29/42364 (2013.01); H01L 29/66462 (2013.01); H01L 29/7787 (2013.01); H01L 29/812 (2013.01); H01L 29/8128 (2013.01);
Abstract

A transistor device includes a compound semiconductor body having a first surface and a two-dimensional charge carrier gas disposed below the first surface in the compound semiconductor body. The transistor device further includes a source in contact with the two-dimensional charge carrier gas and a drain spaced apart from the source and in contact with the two-dimensional charge carrier gas. A first passivation layer is in contact with the first surface of the compound semiconductor body, and a second passivation layer is disposed on the first passivation layer. The second passivation layer has a different etch rate selectivity than the first passivation layer. A gate extends through the second passivation layer into the first passivation layer.


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