The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2016
Filed:
Nov. 23, 2011
Tae Hyun Rhee, Yongin-si, KR;
Seon Min Rhee, Seoul, KR;
Hyun Jung Shim, Seoul, KR;
DO Kyoon Kim, Seongnam-si, KR;
Abhijeet Ghosh, Playa Del Rey, CA (US);
Jay Busch, Lawndale, CA (US);
Jen-yuan Chiang, Pasadena, CA (US);
Paul Debevec, Marina Del Rey, CA (US);
Tae Hyun Rhee, Yongin-si, KR;
Seon Min Rhee, Seoul, KR;
Hyun Jung Shim, Seoul, KR;
Do Kyoon Kim, Seongnam-si, KR;
Abhijeet Ghosh, Playa Del Rey, CA (US);
Jay Busch, Lawndale, CA (US);
Jen-Yuan Chiang, Pasadena, CA (US);
Paul Debevec, Marina Del Rey, CA (US);
Samsung Electronics Co., Ltd., Suwon-si, KR;
University of Southern California, Los Angeles, CA (US);
Abstract
Provided is a method and apparatus for realistically reproducing an eyeball that may verify and analyze a material property and a deformation property with respect to each of constituent portions of an eyeball and may render each of the constituent portions based on the analyzed priorities, thereby more realistically reproducing the eyeball.