The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2016

Filed:

Jun. 26, 2015
Applicant:

Berliner Glas Kgaa Herbert Kubatz Gmbh & Co., Berlin, DE;

Inventor:

Thomas Oberdoerster, Berlin, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 1/00 (2006.01); G01J 1/42 (2006.01); G01J 1/04 (2006.01);
U.S. Cl.
CPC ...
G01J 1/4257 (2013.01); G01J 1/0477 (2013.01);
Abstract

Method for measuring shape of wavefront of optical radiation field generated by radiation source, includes: (a) setting diaphragm positions in pinhole diaphragm having diaphragm opening movable transversely to radiation source's optical axis, wherein a partial beam from radiation field passes through diaphragm opening at each diaphragm position and is imaged on optical sensor by imaging optics device; (b) recording lateral positions of partial beam relative to optical axis of imaging optics device, wherein lateral positions each with one of the diaphragm positions of pinhole diaphragm are recorded by optical sensor, and determining the shape of wavefront from recorded lateral positions of partial beam, wherein beam incidence range of the partial beam which is invariable for all diaphragm positions is set on imaging optics device with a pentaprism arrangement including at least first pentaprism and positioned between pinhole diaphragm and imaging optics device. A wavefront shape measuring device is also described.


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