The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2016

Filed:

Sep. 26, 2013
Applicant:

National Taiwan University, Taipei, TW;

Inventors:

Chien-Chung Tsai, Taipei, TW;

Sheng-Lung Huang, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01); G02B 27/14 (2006.01); G02B 21/00 (2006.01);
U.S. Cl.
CPC ...
G01B 9/02015 (2013.01); G01B 9/02049 (2013.01); G01B 9/02058 (2013.01); G02B 21/0056 (2013.01);
Abstract

A scan lens and an interferometric measuring device using the scan lens are disclosed. The scan lens includes a lens set, a beam splitter, and a reflector disposed between the lens set and the beam splitter. During application the applied light beam passes through the lens set of the interferometric measuring device to fall upon the beam splitter where the light beam that passes through the beam splitter is defined as a first light beam and the light beam that is reflected by the beam splitter is defined as a second light beam. The first light beam is projected onto the test object. The second light beam is projected onto the reflector. The second light beam reflected by the reflector and the first light beam reflected or scattered by the test object will interfere with each other to form interference patterns for measuring the test object.


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