The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2016

Filed:

Apr. 13, 2012
Applicants:

Nicholas Carrejo, Katy, TX (US);

Michael H. Johnson, Katy, TX (US);

Inventors:

Nicholas Carrejo, Katy, TX (US);

Michael H. Johnson, Katy, TX (US);

Assignee:

BAKER HUGHES INCORPORATED, Houston, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
E21B 41/00 (2006.01); E21B 43/10 (2006.01); C09K 3/10 (2006.01); F03G 7/06 (2006.01); E21B 43/08 (2006.01);
U.S. Cl.
CPC ...
E21B 41/00 (2013.01); C09K 3/1021 (2013.01); E21B 43/108 (2013.01); F03G 7/065 (2013.01); C08L 2201/12 (2013.01); E21B 43/08 (2013.01); Y10T 29/49865 (2015.01); Y10T 156/1005 (2015.01);
Abstract

Wellbore devices for use in filtration, wellbore isolation, production control, lifecycle management and wellbore construction may include at least a first and a second shape-memory material each having an altered geometric position and each an original geometric position. Each shape-memory material may include a polyurethane material held in the altered geometric run-in position at a temperature below glass transition temperature (T), where the Ts and/or the respective slope changes of the first and second polyurethane materials are different. Once the wellbore device is in place downhole and the first and second shape-memory materials are subjected to temperatures above their Ts, the materials will deploy and expand to recovered geometric positions at or near their original geometric positions to perform their filtration, isolation, control or other function. These deployments or expansions may occur at different times or rates.


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