The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2016
Filed:
Mar. 28, 2014
Shima Seiki Mfg., Ltd., Wakayama-shi, Wakayama, JP;
Masamitsu Ikenaka, Wakayama, JP;
Chiharu Kiyohara, Wakayama, JP;
Shima Seiki MFG., LTD., Wakayama, JP;
Abstract
There is provided a knitted fabric in which a spacing of an open portion can be adjusted as necessary, and a method for knitting the same. An inlay knitting of interweaving a first line (Y) supplied from a far side line feeder (F) into a first knitted fabric portion () is carried out (process α). An inlay knitting of interweaving a second line (Y) supplied from a near side line feeder (F) into a second knitted fabric portion () is carried out, and the second line (Y) is made intersect the first line (Y) on the open portion () side (process β). An inlay knitting of interweaving the first line (Y) into the first knitted fabric portion () is carried out, and a state in which the first line (Y) is entwined around the second line (Y) and turned back is obtained (process γ). An inlay knitting of interweaving the second line (Y) into the second knitted fabric portion () is carried out, and a turn-back end of the first line (Y) and a turn-back end of the second line (Y) are entwined (process δ).