The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2016

Filed:

Sep. 05, 2008
Applicants:

Guoping Mao, Woodbury, MN (US);

Moses M. David, Woodbury, MN (US);

Olester Benson, Jr., Woodbury, MN (US);

Robert J. Devoe, Arden Hills, MN (US);

Jennifer J. Sahlin, Minneapolis, MN (US);

Inventors:

Guoping Mao, Woodbury, MN (US);

Moses M. David, Woodbury, MN (US);

Olester Benson, Jr., Woodbury, MN (US);

Robert J. DeVoe, Arden Hills, MN (US);

Jennifer J. Sahlin, Minneapolis, MN (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/24 (2006.01); B29C 33/58 (2006.01); C23C 16/40 (2006.01); G02B 1/118 (2015.01); B29C 33/38 (2006.01); B29C 33/40 (2006.01); B29K 83/00 (2006.01); B29K 105/00 (2006.01);
U.S. Cl.
CPC ...
B29C 33/58 (2013.01); C23C 16/401 (2013.01); G02B 1/118 (2013.01); B29C 33/3857 (2013.01); B29C 33/405 (2013.01); B29K 2083/005 (2013.01); B29K 2105/0082 (2013.01);
Abstract

A method of forming a working mold including placing a substrate near an electrode in a chamber, the substrate () having at least a first structured surface (); providing power to the electrode to create a plasma, —introducing vapor of liquid silicone molecules into the plasma; and depositing a release layer (), the release layer () including a silicone containing polymer, the release layer () being deposited on at least a portion of the first structured surface of the substrate to form the working mold.


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