The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 13, 2016

Filed:

Jun. 10, 2013
Applicant:

Jh Rhodes Company, Inc., Tempe, AZ (US);

Inventors:

Brent Muncy, Clark Mills, NY (US);

James Anderson, Albany, NY (US);

Scott B. Daskiewich, Oriskany, NY (US);

George James Wasilczyk, Allentown, PA (US);

Assignee:

JH Rhodes Company, Inc., Tempe, AZ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/26 (2012.01); B24B 13/02 (2006.01); B24D 13/14 (2006.01); B24B 7/24 (2006.01);
U.S. Cl.
CPC ...
B24B 13/02 (2013.01); B24B 7/24 (2013.01); B24B 37/26 (2013.01); B24D 13/14 (2013.01);
Abstract

A polishing pad, for polishing of a work piece having portions that are non-planar, the polishing pad comprising a first side and a second side of the polishing pad. The first side is substantially flat, and the second side is configured to polish the non-planar work piece. The polishing pad further comprises a concentric annular channel in the polishing pad, wherein the concentric annular channel comprises a channel surface, wherein the second side of the polishing pad comprises an inner surface, the channel surface, and an outer surface, and wherein the channel surface is recessed relative to the inner surface and outer surface. The polishing pad further comprises a plurality of islands located within the concentric annular channel, wherein the islands comprise an island surface that is raised relative to the channel surface.


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