The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9437818 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 06, 2016

Filed:

May. 31, 2013
Applicant:

Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;

Inventors:

Jin-Hong Jeun, Yongin, KR;

Seok-Joo Lee, Yongin, KR;

Jung-Hun Yeon, Yongin, KR;

Assignee:

Samsung Display Co., Ltd., Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 51/00 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0013 (2013.01); G03F 9/7019 (2013.01);
Abstract

An exposure apparatus capable of preventing a reduction in its accuracy due to, for example, the influence of aging or the influence of heat is disclosed. Also disclosed is a method of controlling the same, and an alignment method for exposure. In one aspect, the exposure apparatus includes a main stage for adjusting a position of a substrate, a beam irradiation unit for irradiating a beam onto a mask, and a beam monitoring unit having a position fixed with respect to the main stage, and for recognizing the beam emitted from the beam irradiation unit and passed through one pattern of the mask.


Find Patent Forward Citations

Jeun, Jin-Hong. (2016). Exposure apparatus, method of controlling the same, and alignment method for exposure (U.S. Patent No. 9437818). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9437818

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