The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2016
Filed:
May. 29, 2015
Hon Hai Precision Industry Co., Ltd., New Taipei, TW;
Kuo-Lung Fang, New Taipei, TW;
Yi-Chun Kao, New Taipei, TW;
Hsin-Hua Lin, New Taipei, TW;
Chih-Lung Lee, New Taipei, TW;
Po-Li Shih, New Taipei, TW;
HON HAI PRECISION INDUSTRY CO., LTD., New Taipei, TW;
Abstract
A method for forming a TFT includes providing a substrate, and forming a gate electrode, an electrically insulating layer, a semiconductor layer, an etch stop layer and a photoresist layer successively on the substrate. A photolithographic process is performed to the photoresist layer by using a half-tone mask to thereby configure the photoresist layer to have two recesses in a top thereof. Two lateral ends of the etch stop layer are etched away to form an etch stop pattern. The photoresist layer is heated to flow downwardly. Two lateral ends of the semiconductor channel are etched away to become a channel layer. An ashing is performed to the photoresist layer to have the recesses thereof communicate atmosphere with the etch stop pattern. The etch stop pattern is etched to define first and second through holes. Source and drain electrodes are formed to electrically connect with the channel layer.