The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2016
Filed:
Feb. 12, 2015
Applicant:
Toyota Jidosha Kabushiki Kaisha, Toyota-shi, Aichi-ken, JP;
Inventors:
Shuhei Oki, Nagakute, JP;
Masaru Senoo, Okazaki, JP;
Assignee:
Toyota Jidosha Kabushiki Kaisha, Toyota-shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/739 (2006.01); H01L 27/07 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7393 (2013.01); H01L 27/0727 (2013.01); H01L 29/66325 (2013.01);
Abstract
A technology for reducing contact resistance between a semiconductor substrate and an electrode is provided. A provided method for manufacturing a semiconductor device includes: forming an oxide filmon a surfaceof a semiconductor substrateby bringing the surfaceinto contact with ammonia-hydrogen peroxide water mixture; forming a grooveon the surfaceby irradiating light to heat the surfacecovered with the oxide film; removing the oxide filmto expose the surface; and forming an electrodeon the exposed surface