The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2016

Filed:

Mar. 02, 2015
Applicant:

Kabushiki Kaisha Toshiba, Minato-Ku, JP;

Inventor:

Koichi Matsuno, Mie, JP;

Assignee:

KABUSHIKI KAISHA TOSHIBA, Minato-ku, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/788 (2006.01); H01L 27/115 (2006.01); H01L 29/66 (2006.01); H01L 29/49 (2006.01); H01L 29/51 (2006.01); H01L 21/28 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11521 (2013.01); H01L 21/0217 (2013.01); H01L 21/02068 (2013.01); H01L 21/28273 (2013.01); H01L 27/11524 (2013.01); H01L 29/495 (2013.01); H01L 29/511 (2013.01); H01L 29/515 (2013.01); H01L 29/518 (2013.01); H01L 29/66825 (2013.01); H01L 29/788 (2013.01);
Abstract

According to an embodiment, a nonvolatile semiconductor memory device comprises: a semiconductor layer; a first gate insulating film; a plurality of floating gate electrodes; a second gate insulating film; a plurality of control gate electrodes; and an upper insulating film. The semiconductor layer is provided on a substrate and extends in a first direction. The floating gate electrode is formed on the semiconductor layer via the first gate insulating film. The control gate electrode faces the upper surface of the floating gate electrode via the second gate insulating film. Moreover, the control gate electrode extends in a second direction intersecting the first direction. The upper insulating film is formed on an upper portion of the plurality of control gate electrodes. Moreover, a height of an upper surface of the upper insulating film changes along the second direction.


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