The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2016
Filed:
Nov. 24, 2014
GE Medical Systems Global Technology Co. Llc, Waukesha, WI (US);
GE Medical Systems Global Technology CO. LLC, Waukesha, WI (US);
Abstract
The present invention provides a method and apparatus for reducing artifacts in CT image reconstruction. The method comprises obtaining an original reconstructed image and an original sinogram and determining a proportion of metal pixels in the original reconstructed image. If the proportion is greater than a first threshold value, then generating an expanded metal template based on the original reconstructed image, generating a metal-free, metal artifact reduced (MAR) image based on the expanded metal template and the original sinogram, and generating a final image based on the expanded metal template and the metal-free, MAR image. However, if the proportion of metal pixels is less than a second threshold value, then generating an expanded metal template based on the original reconstructed image, generating a metal-free, metal artifact reduced image based on a treatment, and generating a final image based on the expanded metal template and the metal-free, MAR image.