The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2016

Filed:

Jun. 13, 2014
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Robert K. Leidy, Burlington, VT (US);

Mark D. Levy, Williston, VT (US);

Qizhi Liu, Lexington, MA (US);

Gary L. Milo, Milton, VT (US);

Steven M. Shank, Jericho, VT (US);

Assignee:

GLOBALFOUNDRIES INC., Grand Cayman, KY;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 6/12 (2006.01); G02B 6/122 (2006.01); G02B 6/125 (2006.01); G02B 6/136 (2006.01);
U.S. Cl.
CPC ...
G02B 6/122 (2013.01); G02B 6/125 (2013.01); G02B 6/136 (2013.01); G02B 2006/12061 (2013.01);
Abstract

Various embodiments include a silicon-based optical waveguide structure locally on a bulk silicon substrate, and systems and program products for forming such a structure by modifying an integrated circuit (IC) design structure. Embodiments include implementing processes of preparing manufacturing data for formation of the IC design structure in a computer-implemented IC formation system, wherein the preparing of the manufacturing data includes inserting instructions into the manufacturing data to convert an edge of the at least one shape from a <110> crystallographic direction to a <100> crystallographic direction.


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