The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2016

Filed:

Sep. 25, 2013
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Nagendra V. Madiwal, Bangalore, IN;

Robert Irwin Decottignies, Redwood City, CA (US);

Andrew Nguyen, San Jose, CA (US);

Paul B. Reuter, Austin, TX (US);

Angela R. Sico, Round Rock, TX (US);

Michael Kuchar, Georgetown, TX (US);

Travis Morey, Austin, TX (US);

Mitchell Disanto, Georgetown, TX (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); C23C 14/56 (2006.01); H01L 21/67 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
C23C 14/566 (2013.01); C23C 14/564 (2013.01); C23C 16/4401 (2013.01); H01L 21/6719 (2013.01); H01L 21/67126 (2013.01); Y10T 29/49432 (2015.01);
Abstract

An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.


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