The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2016
Filed:
Aug. 09, 2012
Applicants:
Yasuhiro Konishi, Sakai, JP;
Norizo Saito, Sakai, JP;
Arumi Higashi, Sakai, JP;
Inventors:
Assignee:
Osaka Prefecture University Public Corporation, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C22B 7/00 (2006.01); C22B 58/00 (2006.01); C22B 3/24 (2006.01); C12N 1/20 (2006.01); B09B 3/00 (2006.01); C12P 3/00 (2006.01);
U.S. Cl.
CPC ...
C22B 58/00 (2013.01); B09B 3/0016 (2013.01); C12N 1/20 (2013.01); C12P 3/00 (2013.01); C22B 3/24 (2013.01); C22B 7/007 (2013.01); Y02P 10/234 (2015.11);
Abstract
According to the present invention, there is provided an indium recovery method for recovering indium from an indium-containing product, including a leaching step of allowing indium to leach into an aqueous hydrochloric acid solution by hydrothermal leaching using the aqueous hydrochloric acid solution as a leaching agent from the indium-containing product to obtain a leachate composed of an aqueous hydrochloric acid solution containing indium, and a separating step of adding a microbe for adsorbing In ions to the leachate to separate indium from the leachate.