The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2016

Filed:

Nov. 16, 2011
Applicants:

Gang Han, Yasugi, JP;

Tatsuya Shoji, Yasugi, JP;

Shujiroh Uesaka, Yasugi, JP;

Mariko Fukumaru, Yasugi, JP;

Maher I. Boulos, Sherbrooke, CA;

Jiayin Guo, Sherbrooke, CA;

Jerzy Jurewicz, Sherbrooke, CA;

Inventors:

Gang Han, Yasugi, JP;

Tatsuya Shoji, Yasugi, JP;

Shujiroh Uesaka, Yasugi, JP;

Mariko Fukumaru, Yasugi, JP;

Maher I. Boulos, Sherbrooke, CA;

Jiayin Guo, Sherbrooke, CA;

Jerzy Jurewicz, Sherbrooke, CA;

Assignees:

HITACHI METALS, LTD., Tokyo, JP;

TEKNA PLASMA SYSTEMS INC., Sherbrooke, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C22B 34/12 (2006.01); B22F 9/28 (2006.01); B22F 9/26 (2006.01); F27D 99/00 (2010.01);
U.S. Cl.
CPC ...
C22B 34/129 (2013.01); B22F 9/26 (2013.01); C22B 34/1272 (2013.01); F27D 99/00 (2013.01);
Abstract

A titanium metal production apparatus is provided with (a) a first flow channel that supplies magnesium in a state of gas, (b) a second flow channel that supplies titanium tetrachloride in a state of gas, (c) a gas mixing section in which the magnesium and titanium tetrachloride in a state of gas are mixed and the temperature is controlled to be 1600° C. or more, (d) a titanium metal deposition section in which particles for deposition are arranged so as to be movable, the temperature is in the range of 715 to 1500° C., and the absolute pressure is 50 kPa to 500 kPa, and (e) a mixed gas discharge section which is in communication with the titanium metal deposition section.


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