The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2016

Filed:

Aug. 30, 2011
Applicants:

Hiromi Kitano, Toyama, JP;

Yoshiyuki Saruwatari, Kashiwara, JP;

Kazuyoshi Matsuoka, Kashiwara, JP;

Inventors:

Hiromi Kitano, Toyama, JP;

Yoshiyuki Saruwatari, Kashiwara, JP;

Kazuyoshi Matsuoka, Kashiwara, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12N 5/071 (2010.01); C12N 5/00 (2006.01);
U.S. Cl.
CPC ...
C12N 5/0686 (2013.01); C12N 5/0068 (2013.01); C12N 2533/30 (2013.01);
Abstract

A method for manufacturing a cell culture substrate obtained by forming a coating layer of a polymer on the surface of a substrate, wherein the polymer is formed by polymerizing a monomer component containing a nitrogen atom-containing monomer represented by formula (I): wherein Ris hydrogen atom or methyl group, Ris an alkylene group having 1 to 6 carbon atoms, each of Rand Ris independently an alkyl group having 1 to 4 carbon atoms, Ris an alkylene group having 1 to 4 carbon atoms, and Y is oxygen atom or —NH— group, includes irradiating the polymer with ion beam at a predetermined position of the coating layer of the polymer, to remove the coating layer of the polymer irradiated with the ion beam.


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