The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2016
Filed:
Sep. 28, 2011
Akihiro Koyama, Takarazuka, JP;
Mikiko Morishita, Pyeongtaek-si, KR;
Satoshi Ami, Yokkaichi, JP;
Kazuaki Hashimoto, Akiruno, JP;
Tetsuo Takano, Tachikawa, JP;
Akihiro Koyama, Takarazuka, JP;
Mikiko Morishita, Pyeongtaek-si, KR;
Satoshi Ami, Yokkaichi, JP;
Kazuaki Hashimoto, Akiruno, JP;
Tetsuo Takano, Tachikawa, JP;
AVANSTRATE INC., Mie, JP;
HOYA CORPORATION, Tokyo, JP;
Abstract
The disclosed cover glass is produced by etching a glass substrate that has been formed by a down-drawing process, and chemically strengthening the glass substrate to provide the glass substrate with a compressive-stress layer on the principal surfaces thereof. The glass substrate contains, as components thereof, 50% to 70% by mass of SiO, 5% to 20% by mass of AlO, 6% to 30% by mass of NaO, and 0% to less than 8% by mass of LiO. The glass substrate may also contain 0% to 2.6% by mass of CaO, if necessary. The glass substrate has an etching characteristic in which the etching rate is at least 3.7 μm/minute in an etching environment having a temperature of 22° C. and containing hydrogen fluoride with a concentration of 10% by mass.