The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2016
Filed:
Sep. 24, 2015
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventor:
Matthew J. Rodnick, San Jose, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G06F 7/00 (2006.01); G06F 19/00 (2011.01); B25J 9/16 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01); H01L 21/66 (2006.01); B25J 13/08 (2006.01); B25J 11/00 (2006.01);
U.S. Cl.
CPC ...
B25J 9/1612 (2013.01); B25J 9/1656 (2013.01); B25J 9/1694 (2013.01); B25J 13/083 (2013.01); H01L 21/67259 (2013.01); H01L 21/68707 (2013.01); H01L 22/26 (2013.01); B25J 11/0095 (2013.01); G05B 2219/39057 (2013.01); G05B 2219/40567 (2013.01); G05B 2219/45031 (2013.01); Y10S 901/09 (2013.01); Y10S 901/47 (2013.01);
Abstract
A wafer handling traction control system is provided that is able to detect slippage of a semiconductor wafer with respect to an end effector and is able to adjust the end effector's movement in order to minimize further slippage. Upon the detection of relative motion of the semiconductor wafer with respect to the end effector past a threshold amount, the end effector's movements are adjusted to minimize slippage of the semiconductor wafer. The wafer handling traction control system may include a sensor that detects relative motion between the semiconductor wafer and the end effector.