The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2016
Filed:
May. 21, 2014
Applicant:
Kabushiki Kaisha Toshiba, Minato-ku, Tokyo, JP;
Inventor:
Masafumi Asano, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C 9/14 (2006.01); B05C 21/00 (2006.01); G03F 7/00 (2006.01); G02F 1/01 (2006.01); C09K 11/06 (2006.01); G01N 21/64 (2006.01); G01N 21/956 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
B05C 21/005 (2013.01); C09K 11/06 (2013.01); G01N 21/6458 (2013.01); G01N 21/956 (2013.01); G02F 1/01 (2013.01); G03F 7/0002 (2013.01); H01L 22/12 (2013.01);
Abstract
According to one embodiment, in a pattern inspection method, a guide pattern is formed on a substrate. A block copolymer is applied on the guide pattern. Thereafter, the substrate is heated according to a predetermined heating condition to promote directed self assembly corresponding to a shape of the guide pattern with respect to the block copolymer. Further, the substrate is observed by a fluorescence microscope during heating or after heating the substrate.