The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2016

Filed:

Oct. 17, 2014
Applicants:

David J. Heldebrant, Richland, WA (US);

Phillip K. Koech, Richland, WA (US);

John C. Linehan, Richland, WA (US);

James E. Rainbolt, Wenatchee, WA (US);

Mark D. Bearden, Richland, WA (US);

Feng Zheng, Richland, WA (US);

Inventors:

David J. Heldebrant, Richland, WA (US);

Phillip K. Koech, Richland, WA (US);

John C. Linehan, Richland, WA (US);

James E. Rainbolt, Wenatchee, WA (US);

Mark D. Bearden, Richland, WA (US);

Feng Zheng, Richland, WA (US);

Assignee:

BATTELLE MEMORIAL INSTITUTE, Richland, WA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/62 (2006.01); B01D 53/77 (2006.01); B01D 53/78 (2006.01); B01D 53/96 (2006.01); B01D 53/14 (2006.01); B01D 53/40 (2006.01);
U.S. Cl.
CPC ...
B01D 53/40 (2013.01); B01D 53/1475 (2013.01); B01D 53/1493 (2013.01); B01D 53/78 (2013.01); B01D 53/77 (2013.01); B01D 2252/20431 (2013.01); B01D 2252/30 (2013.01); B01D 2252/40 (2013.01); B01D 2257/504 (2013.01); Y02C 10/06 (2013.01);
Abstract

A system, method, and material that enables the pressure-activated reversible chemical capture of acid gasses such as COfrom gas volumes such as streams, flows or any other volume. Once the acid gas is chemically captured, the resulting product typically a zwitterionic salt, can be subjected to a reduced pressure whereupon the resulting product will release the captures acid gas and the capture material will be regenerated. The invention includes this process as well as the materials and systems for carrying out and enabling this process.


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