The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2016

Filed:

May. 07, 2015
Applicant:

Broadcom Corporation, Irvine, CA (US);

Inventors:

Christopher Ward, The Netherlands, NL;

Klaas Bult, Bosch en Duin, NL;

Iniyavan Elumalai, Utrecht, NL;

Assignee:

Broadcom Corporation, Irvine, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03M 1/06 (2006.01); H03M 1/66 (2006.01); H03K 17/16 (2006.01);
U.S. Cl.
CPC ...
H03M 1/0604 (2013.01); H03K 17/165 (2013.01); H03M 1/66 (2013.01);
Abstract

A semiconductor device fabrication operation is commonly used to manufacture one or more integrated circuits onto a semiconductor substrate. The semiconductor device fabrication operation forms one or more transistors onto an arrangement of fabrication layers to form the one or more integrated circuits which introduces unwanted capacitances, often referred to as parasitic capacitances, into the one or more transistors. The one or more integrated circuits include one or more compensation modules that, when combined with the parasitic capacitances of the one or more transistors, ideally linearizes the non-linearity caused by the parasitic capacitances of the one or more transistors. For example, the one or more compensation modules incorporate a non-linear or a piecewise linear transfer function that is inversely related to the parasitic capacitances of the one or more transistors.


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