The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2016

Filed:

May. 07, 2008
Applicants:

Nicolas Blondiaux, Neuchatel, CH;

David Hasler, Neuchatel, CH;

Raphael Pugin, Auvernier, CH;

Edoardo Franzi, Yverdon-les-Bains, CH;

Inventors:

Nicolas Blondiaux, Neuchatel, CH;

David Hasler, Neuchatel, CH;

Raphael Pugin, Auvernier, CH;

Edoardo Franzi, Yverdon-les-Bains, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 19/00 (2006.01); G06K 19/08 (2006.01); B42D 25/29 (2014.01); B42D 25/00 (2014.01);
U.S. Cl.
CPC ...
G06K 19/086 (2013.01); B42D 25/00 (2014.10); B42D 25/29 (2014.10);
Abstract

A security device for the identification or authentication of valuable goods is described, including a thin material layer () presenting a stochastic pattern including micro/submicrostructures, where the latter are arranged in blobs () each of which presents a complexity factor where L is the perimeter of the blob and A its area, and wherein blobs having a Cvalue greater than or equal to 2 cover at least 5%, preferably at least 15%, of the device surface. According to a preferred embodiment, the material layer may include a film including at least a first and a second polymers arranged respectively within a first and a second phases defining the micro/submicrostructures. Preferred processes of fabrication are also disclosed, as well as a method for securing a valuable good based on such a security device.


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