The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2016
Filed:
Mar. 23, 2016
Samsung Sds Co., Ltd., Seoul, KR;
Sudhakar Sah, Seoul, KR;
Sang Hak Lee, Seoul, KR;
Jong Hang Kim, Seoul, KR;
Seong Jong Ha, Seoul, KR;
Yu Ri Ahn, Seoul, KR;
Yeon Hee Kwon, Seoul, KR;
SAMSUNG SDS CO., LTD., Seoul, KR;
Abstract
According to an aspect of the present invention, there is provided a method of detecting a repetitive pattern. The method includes: clustering a plurality of pixels that form an input image according to color and obtaining one or more color layers composed of pixels included in each cluster; selecting one or more effective layers from the color layers, wherein each of the effective layers includes a predetermined number or more of pixel components, each composed of a plurality of pixels and having a predetermined shape or a predetermined size of area; selecting a unit pattern repeatedly disposed at different locations in each effective layer from the pixel components included in each effective layer; calculating distances between the unit patterns in each effective layer; and calculating a repetition cycle of the unit pattern of the input image based on the calculated distances in each effective layer.