The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2016
Filed:
Jul. 03, 2015
Tcl Research America Inc., San Jose, CA (US);
Michael Iliadis, San Jose, CA (US);
Armin Kappeler, San Jose, CA (US);
Haohong Wang, San Jose, CA (US);
TCL RESEARCH AMERICA INC., San Jose, CA (US);
Abstract
The present invention provides a face recognition method. The method includes obtaining a plurality of training face images which belongs to a plurality of face classes and obtaining a plurality of training dictionaries corresponding to the training face images. A face class includes one or more training face images. The training dictionaries include a plurality of deep feature matrices. The method further includes obtaining an input face image. The input face image is partitioned into a plurality of blocks, whose corresponding deep feature vectors are extracted using a deep learning network. A collaborative representation model is applied to represent the deep feature vectors with the training dictionaries and representation vectors. A summation of errors for all blocks corresponding to a face class is computed as a residual error for the face class. The input face image is classified by selecting the face class that yields a minimum residual error.