The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2016
Filed:
Jul. 29, 2014
Boe Technology Group Co., Ltd., Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
Abstract
The present invention discloses an exposure mask, an exposure apparatus, and a method for manufacturing a display substrate, which are used for forming a pattern with a smaller aperture, a narrower slit, or a line of smaller width on a photoresist layer. The exposure mask includes a mask body and an anti-diffraction film layer located at a light emergent side of the mask body. Wherein the mask body includes a light transmissive region and a light non-transmissive region; a region of the anti-diffraction film layer which corresponds to at least the light transmissive region of the mask body is a light transmissive region; and the anti-diffraction film layer is a film layer whose refractive index n satisfies n>1.