The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2016
Filed:
Apr. 25, 2013
Sharp Kabushiki Kaisha, Osaka-shi, Osaka, JP;
Tokio Taguchi, Tenri, JP;
Shun Ueki, Nara, JP;
Kozo Nakamura, Kashiba, JP;
Kazuhiko Tsuda, Nara, JP;
SHARP KABUSHIKI KAISHA, Osaka, JP;
Abstract
A method for making a stamper which has an uneven surface pattern, in which unit structures are arranged in x and y directions at respective periods that are both shorter than the shortest wavelength of an incoming light ray, on the surface of a substrate and satisfies the following Inequality (1): where λis the shortest wavelength of the incoming light ray, θiis the largest angle of incidence of the incoming light ray, ni is the refractive index of an incidence medium, Λx is the period of the uneven surface pattern in the x direction, and Λy is the period of the pattern in the y direction. As a result, diffraction of short-wave light components can be reduced in a broad wavelength range.