The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2016
Filed:
Nov. 26, 2013
Applied Materials, Inc., Santa Clara, CA (US);
Nir Merry, Mountain View, CA (US);
Chandrakant M. Sapkale, Karnataka, IN;
Karuppasamy Muthukamtchi, Tamil Nadu, IN;
Jeffrey C. Hudgens, San Francisco, CA (US);
Penchala N. Kankanala, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Process chamber gas flow control apparatus having a tiltable valve are disclosed. The gas flow apparatus includes a process chamber adapted to contain a substrate, an exit from the process chamber including a valve seat, and a tiltable valve configured and adapted to tilt relative to the valve seat to control flow non-uniformities within the process chamber. Systems and methods including the tiltable valve apparatus are disclosed, as are numerous other aspects.