The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2016

Filed:

Sep. 11, 2014
Applicant:

Nippon Shokubai Co., Ltd., Osaka-shi, Osaka, JP;

Inventors:

Daisuke Michitaka, Suita, JP;

Atsuro Yoneda, Suita, JP;

Kenji Kuwada, Suita, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 220/06 (2006.01);
U.S. Cl.
CPC ...
C08F 220/06 (2013.01);
Abstract

Provided is a (meth)acrylic acid-based copolymer containing, as structural units, a structural unit derived from a sulfonic acid (salt) group-containing monomer and a structural unit derived from (meth)acrylic acid (salt), the copolymer being capable of expressing an excellent effect on the dispersion of hydrophobic particles. Also provided is a method of producing such (meth)acrylic acid-based copolymer. A (meth)acrylic acid-based copolymer of the present invention contains: 1 mass % to 20 mass % of a structural unit (a) derived from an ether bond-containing hydrophobic monomer (A) represented by a specific structure; 1 mass % to 50 mass % of a structural unit (b) derived from a sulfonic acid (salt) group-containing monomer (B) represented by a specific structure; and 30 mass % to 98 mass % of a structural unit (c) derived from (meth)acrylic acid (salt) (C).


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